TESCAN
TESCAN
TESCAN
TESCAN
TESCAN
TESCAN
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About Company

TESCAN is one of the global suppliers of scientific instruments. The company is building its reputation and brand name in the field of designing and manufacturing scanning electron microscopes and system solutions for different applications.

News

TESCAN ORSAY HOLDING, a.s. acquires AppFive, LLC.

Expanding the software R&D capacities in the U.S. Brno, Czech Republic ̶ August 3rd, 2015 ̶ TESCAN ORSAY HOLDING, a.s. (TOH), a leading global instrumentation company supplier and developer of scanning electron microscopes, focused ion beams, and dual beam systems, today announced the acquisition of AppFive, LLC, an application software and technique development company in the field of charged particle optics. Read more

TESCAN FIB/SEM Commissioned at Curtin University

AXT, TESCAN´s agent in Australia and New Zealand, is pleased to announce that they have recently completed the installation of a TESCAN LYRA Focussed Ion Beam/Scanning Electron Microscope (FIB/SEM) at Curtin University in Perth, Australia, as part of the National Resource Sciences Precint’s Advanced Resource Characterisation Facility. This follows the winning of a competitive tender for the CSIRO, who have collaborated with Curtin University and the University of Western Australia. Read more

Introducing XEIA3 - Visit us during M&M 2015

During the M&M 2015 to be held in Portland, Oregon, US (August 2-6, 2015) the new TESCAN microscope will be introduced. Read more

Upcoming Event

6. September 2015 to 9. September 2015

6.-11.9.2015, Göttingen (Germany)

Application examples

Microcapsules containing a drug, tramadol hydrochloride, were formed by a solvent evaporation method. Scanning electron microscopy (SEM) revealed that the microcapsules, prepared under various experimental conditions, differ in the size and porosity of the encapsulating material, which can affect drug release in an organism. Microencapsulated drugs are expected to be widely used in medical treatment.

Product Focus

TESCAN

The world’s first fully integrated Xe plasma source FIB with SEM enables extremely high ion currents up to 2 μA thus increasing sputtering rate more than 50 times compared to conventional Ga source. This predetermines FERA3 for milling big volumes of materials that were time consuming or impossible so far.

Products List

Regional distributors