High-Resolution Xe Plasma FIB

We are pleased to announce the launch of the high-resolution Xe plasma FIB column technology. The newly developed ion column is now capable of achieving resolution of < 15 nm at 30 keV.
This improvement has made Xe plasma FIB a more versatile nano/micro-patterning tool extending its range of use into the area of traditional Ga FIB applications.

With the new high-resolution Xe plasma FIB column you can complete large-scale milling tasks in unbeatable times at high currents, and, on the other hand, perform tasks using the smallest spot size for all those applications that require higher levels of precision. This is a significant improvement over the state-of-the-art.

Find more about this new Xe plasma FIB column technology.

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