Workshop on Field emission scanning electron microscopy-based lithography

Jun/06/2017
Jointly organized by the Advanced Instrumentation Research Facility at Jawaharlal Nehru University and TESCAN
A two-day seminar on TESCAN scanning electron microscope with Ga focused ion beam took place at the Advanced Instrumentation Research Facility at the Jawaharlal Nehru University in New Delhi. This seminar was focused on Field Emission Scanning Electron Microscopy Based-Lithography. The TESCAN specialist along with the invited professors performed presentations and live demonstrations of the TESCAN FIB-SEM LYRA3 microscope and its application to electron and ion beam lithography.

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