GAIA3 model 2016

GAIA3 model 2016 is the ideal platform for performing the most challenging nanoengineering applications that require ultimate precision and demanding capabilities for microanalysis. The preparation of high-quality ultra-thin TEM lamella, delayering processes in technology nodes, precise nanopatterning or high-resolution 3D reconstructions are just some of the applications in which GAIA3 excels.
Such features make GAIA3 model 2016 the ideal instrument for applications in which imaging at low beam energies is a requirement to preserve delicate structures in the samples that can get easily damaged by the electron beam such as low-k dielectric materials, photoresists or uncoated biological specimens. In terms of sample modification, GAIA3 model 2016 represents the most suitable solution for challenging nanomachining and nanofabrication.

Key features

Triglav™ - newly designed UHR electron column

  • TriLens™ objective system: unique combination of three-lens objective and crossover-free beam path
  • Advanced detection system with multiple SE and BSE detectors
  • Triglav™ - Ultimate ultra-high resolution at low beam energy: 1 nm at 1 keV and 0.7 nm at 15 keV
  • EquiPower™ thermal power dissipation system for excellent electron column stability
  • Electron beam currents up to 400 nA and rapid beam energy changes
  • Optimised column geometry for accommodating large wafers up to 8”

Cobra FIB column

High-performance Ga FIB column for ultimate precision in nanoengineering.
  • Probe current: 1 pA 50 nA
  • Resolution: < 2.5 nm at 30 kV at SEM-FIB coincidence point
  • Top level technology in terms of resolution for both milling and imaging
  • Cobra guarantees the shortest time to result in cross-sectioning and TEM sample preparation
  • Ideal for 3D ultra-structural studies of biological specimens such as tissue and whole cells
  • Excellent performance at low kV ideal for polishing ultra-thin lamellae and for reducing amorphous layers
GAIA3 model 2016
GAIA3 model 2016

Product Brochure

GAIA3 model 2016 brochure
Extraordinary Ultra-High Resolution imaging and extremely precise nanoengineering. Download GAIA3 model 2016 brochure!
pdf – 5 MB

Life Sciences

Materials Science

Semiconductors & Microelectronics