Steels & Metal Alloys
Ceramics and Hard Coatings
Polymers & Composites
Material for Building & Civil Engineering
Wood, Textile & Paper
Cell & Tissue morphology
Plant and Animal biology
Environmental and Food Sciences
Failure Analysis of Integrated Circuits
Ball Grid Array
Through Silicon Vias
Petrology & Mineralogy
Oil & Gas
MAIA3 model 2016
XEIA3 model 2016
GAIA3 model 2016
Q-PHASE: Quantitative, label-free imaging cytometry
TIMA-X TESCAN Integrated Mineral Analyser
TESCAN SEM/FIB-SEM with integrated Raman spectrometry
Beam Deceleration Technology
Electron Backscatter Diffraction
Low Vacuum Secondary Electron TESCAN Detector
Electron Beam Induced Current
Secondary Ion TESCAN Detector
Gas Injection System
Peltier cooling and heating stage
Optical stage navigation
Extended XM and GM chambers
Scanning electron microscopes are used for detailed study of samples from different kinds of materials (e.g. metals and their alloys, polymers, ceramics, biological samples, nanoparticles, nanofibers, etc.). Some applications require that only certain areas of the sample are exposed to the electron beam, while other areas are protected from exposure.
Beam Blanker is used to divert the electron beam from the optical axis of the SEM column thus preventing electrons from reaching the sample surface. The Beam Blanker is suitable for the following applications:
Electron beam lithography - blocking the beam between the individual objects in the pattern
Sensitive samples - to prevent their contamination or degradation and reduced charging effects.
TESCAN offers two types of
: electromagnetic and electrostatic.
The electromagnetic Beam Blanker is a standard accessory of all TESCAN microscopes.
The electrostatic Beam Blanker is an optional accessory.
When using only electromagnetic beam blanking, some electrons can still fall on unwanted areas of the sample surface. Therefore, the
combination of both Beam Blankers is best
for achieving the highest quality of electron beam deflection (e.g. fast and complete blanking). Electron beam lithography applications require having both types of Beam Blanker.
Semiconductors & Microelectronics
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