Focused ion beam scanning electron microscopy (FIB-SEM) combines two beams (electron and ion) in one instrument. The FIB column is used for cross sectioning or sample modification, while the SEM column provides high resolution imaging, in many instances concurrent with FIB milling. FIB-SEM solutions open up a world of new applications not possible to achieve with either as a standalone system.
The geometry of FIB-SEM systems is such that the electron and ion beam focal points coincide, making simultaneous SEM imaging during FIB milling possible – a significant leap in terms of performance and throughput for FIB operations that demand ultimate levels of precision.

TESCAN offers two different ion species for FIB sources: gallium ions and xenon ion plasma. Ga ion source FIB is preferred for all applications that need ultimate precision for fabrication and nanopatterning. Xenon plasma FIBs deliver much higher ion beam currents compared to Ga-FIB to remove large volumes of material in times frames that can be up to 50× shorter than Ga-FIB.. In terms of precision, our high-resolution xenon plasma FIBs achieve a resolution of < 15 nm for applications that require both high speed milling and precision.  

Our portfolio of FIB-SEM solutions serve routine industrial research applications, as well as a wide range of material and life sciences applications that require the highest standards in imaging and micro/nanomachining performance.


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