Testing pattern transferred to e-beam resist on the sample using EBL
TESCAN’s EssenceTM EBL Kit is a complete hardware and software solution that brings cost-effective, intermediate-level electron beam lithography to TESCAN’s G4 portfolio of SEM and FIB-SEM. The EssenceTM EBL Kit is an ideal solution for labs that need electron beam lithography capability but don’t require a dedicated advanced lithography system. Adding electron beam lithography to a SEM or even a FIB-SEM creates a powerful solution for micro-and nano-prototyping applications because researchers are able to capitalize on the analytical capabilities of SEM and FIB-SEM following the lithography process to validate structures, dimensions or material composition. With the TESCAN EBL solution integrated on a FIB-SEM system, it can be used in combination with separately controlled ion beam-based lithography techniques for both basic and applied research.
Working in conjunction with TESCAN’s fast, electrostatic beam blanker, the EssenceTM EBL Kit provides a fully integrated solution. TESCAN’s dedicated electron beam lithography software module operates within the TESCAN EssenceTM GUI for complete control over the entire lithography process from the already familiar microscope operation software. In addition to the software, the EssenceTM EBL Kit includes a starter supply of accessories, including holder and samples.
Read more about the new TESCAN EssenceTM EBL Kit – Press Release.